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Development of a radiation-hardened standard cell library for 65nm CMOS technology

机译:65nm CMOS技术的辐射硬化标准细胞库的开发

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We have developed a radiation-hardened standard cell library for space applications based on the commercial 65nm CMOS technology process. The standard cells are designed using some radiation-hardened (RH) techniques, and the effects of these RH approaches have been validated. Also this 65nm CMOS RH standard cell library has been characterized to support the verilog to GDSII design flow, and the designed radiation tolerant features of this library are: TID > 500 Krad(Si), SEL > 100 MeV cm2/mg, SEU > 37 MeV cm2/mg.
机译:我们开发了一种基于商业65nm CMOS技术过程的空间应用的辐射硬化标准单元库。使用一些辐射硬化(RH)技术设计了标准电池,并验证了这些RH方法的效果。此外,该65nm CMOS RH标准单元库的特征在于支持VERILOG到GDSII设计流程,而该图书馆的设计辐射耐受特征是:TID> 500 Krad(Si),Sel> 100 MeV CM2 / Mg,SEU> 37 mev cm2 / mg。

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