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Detection and characterization of single MOS interface traps by the charge pumping method

机译:电荷泵浦法检测和表征单个MOS接口陷阱

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摘要

We made systematic measurements of the maximum charge pumping current from single MOS interface traps, and found that two energy levels are formed per trap, and the current shows various values of 0~2fq (f: the gate pulse frequency, q: the electron charge), depending upon the two energy levels. Moreover, we demonstrated fundamental trap counting, and found that the variability in the actual number of traps is quite large.
机译:我们对单个MOS接口陷阱的最大电荷泵浦电流进行了系统的测量,发现每个陷阱形成两个能级,并且电流显示出0〜2fq的各种值(f:栅极脉冲频率,q:电子电荷),具体取决于两个能级。此外,我们展示了基本的陷阱计数,并发现实际陷阱数量的变异性非常大。

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