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Method and Apparatus for the characterization of interface trap using photo-excited charge-collection spectroscopy, and Recording medium thereof

机译:利用光激发电荷收集光谱表征界面陷阱的方法和装置及其记录介质

摘要

PURPOSE: A method for analyzing interfacial defects using photoelectric spectroscopy, a recording media for the same, and an apparatus for the same are provided to minimize the deformation of analyzing specimen under an analyzing process using an optical signal. CONSTITUTION: Single wavelength optical signals are applied to the interface between the channel semiconductor(8) and the gate insulating film(7) of a transistor according to the order from a long wavelength to a short wavelength. Threshold voltages for each wavelength are measured based on the relation between gate voltages and drain currents for each wavelength. The defect electric charge amount of the interface is calculated, based on the threshold voltages. The concentration of defects per energy level is calculated based on the defect electric charge amount.
机译:目的:提供一种使用光电光谱法分析界面缺陷的方法,一种用于该方法的记录介质以及一种用于该方法的设备,以最小化在使用光信号的分析过程中分析样本的变形。组成:单波长光信号按照从长波长到短波长的顺序施加到沟道半导体(8)和晶体管的栅极绝缘膜(7)之间的界面。基于每个波长的栅极电压和漏极电流之间的关系来测量每个波长的阈值电压。基于阈值电压计算界面的缺陷电荷量。基于缺陷电荷量计算每能级的缺陷浓度。

著录项

  • 公开/公告号KR101141242B1

    专利类型

  • 公开/公告日2012-05-04

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20090130083

  • 发明设计人 임성일;김재훈;이기문;

    申请日2009-12-23

  • 分类号H01L21/66;

  • 国家 KR

  • 入库时间 2022-08-21 17:08:09

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