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Shape Change of Cured 2D and 3D Nanostructures from Imprint Lithography

机译:压缩光刻的固化2D和3D纳米结构的形状变化

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摘要

Nanosculpting, the fabrication of two- and three-dimensional shapes at the nanoscale, enables applications in photonics, metamaterials, multi-bit magnetic memory, and bio-nanoparticles. A promising high resolution and high throughput method for nanosculpting is nanoimprint lithography (NIL). A key requirement to achieving manufacturing viability of nanosculptures in NIL is maintaining image fidelity through each step of the imprinting process. In particular, polymer densification during UV curing can distort the imprinted image. Here we study the shape changes introduced by polymer densification and develop a forward method for predicting changes in nanoscale geometries from UV curing. We show that shape changes by polymer densification are governed by the Poisson's ratio, the shrinkage coefficient of the polymer resist, and the geometric aspect ratios of the nanosculpted shape. We also show that the size of the residual layer does not impact the final profile of the imprinted shape.
机译:纳米级,纳米级的两维形状的制造使得在光子,超材料,多级磁存储器和生物纳米粒子中的应用。纳米级的高分辨率和高通量方法是纳米压印光刻(NIL)。实现NIL中纳米级制造活力的关键要求是通过印刷过程的每个步骤维持图像保真度。特别地,UV固化期间的聚合物致密化可以扭曲印迹图像。在这里,我们研究了聚合物致密化引入的形状变化,并开发了一种从UV固化中预测纳米级几何形状的变化的前进方法。我们表明,聚合物致密化的形状变化是由泊松比,聚合物抗蚀剂的收缩系数和纳米镜片形状的几何纵横比的管辖。我们还表明,残留层的尺寸不会影响压印形状的最终轮廓。

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