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Co-sputtered amorphous Ge-Sb-Se thin films: Optical properties and structure

机译:共溅射无定形GE-SB-SE薄膜:光学性质和结构

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The unique properties of amorphous chalcogenides such as wide transparency in the infrared region, low phonon energy, photosensitivity and high linear and nonlinear refractive index, make them prospective materials for photonics devices. The important question is whether the chalcogenides are stable enough or how the photosensitivity could be exacerbated for demanded applications. Of this view, the Ge-Sb-Se system is undoubtedly an interesting glassy system given the antinomic behavior of germanium and antimony with respect to photosensitivity. The amorphous Ge-Sb-Se thin films were fabricated by a rf-magnetron co-sputtering technique employing the following cathodes: GeSe_2, Sb_2Se_3 and Ge_(28)Sb_(12)Se_(60). Radio-frequency sputtering is widely used for film fabrication due to its relative simplicity, easy control, and often stoichiometric material transfer from target to substrate. The advantage of this technique is the ability to explore a wide range of chalcogenide film composition by means of adjusting the contribution of each target. This makes the technique considerably effective for the exploration of properties mentioned above. In the present work, the influence of the composition determined by energy-dispersive X-ray spectroscopy on the optical properties was studied. Optical bandgap energy E_g~(opt) was determined using variable angle spectroscopic ellipsometry. The morphology and topography of the selenide sputtered films was studied by scanning electron microscopy and atomic force microscopy. The films structure was determined using Raman scattering spectroscopy.
机译:红外区域中无定形硫属化合物的独特性质,低位透明度,低位能量,光敏性和高线性和非线性折射率,使其成为光子学装置的前瞻性材料。重要的问题是硫属元素化物是否足够稳定,或者光敏性如何加剧要求的应用。在这种观点中,GE-SB-SE系统无疑是一种有趣的玻璃系统,鉴于锗和锑相对于光敏性的锑的抗敏感行为。通过采用以下阴极的RF-磁控型共溅射技术制造非晶GE-SB-SE薄膜:GESE_2,SB_2SE_3和GE_(28)SB_(12)SE_(60)。射频溅射广泛用于薄膜制造,由于其相对简单,易于控制,并且通常是从靶向底物的化学计量的材料转移。这种技术的优点是通过调节每个靶标的贡献,能够探讨各种硫属化物膜组合物。这使得该技术对上述性质的探索显着有效。在本作工作中,研究了通过能量分散X射线光谱法测定的组合物对光学性质的影响。使用可变角度光谱椭圆形测定光学带隙能量E_G〜(OPT)。通过扫描电子显微镜和原子力显微镜研究硒化型溅射膜的形态和形貌。使用拉曼散射光谱法测定膜结构。

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