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首页> 外文期刊>Thin Solid Films >Optical And Electrical Properties Of Co-sputtered Amorphous Transparent Conducting Zinc Indium Tin Oxide Thin Films
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Optical And Electrical Properties Of Co-sputtered Amorphous Transparent Conducting Zinc Indium Tin Oxide Thin Films

机译:共溅射非晶透明导电锌铟锡氧化物薄膜的光电性能

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摘要

Highly conductive and transparent thin films of amorphous zinc indium tin oxide are prepared at room temperature by co-sputtering of zinc oxide and indium tin oxide. Cationic contents in the films are varied by adjusting the power to the sputtering targets. Optical transmission study of films showed an average transmission greater than 85% across the visible region. Maximum conductivity of 6× 10~2 S cm~(-1) is obtained for Zn/In/ Sn atomic ratio 0.4/0.4/0.2 in the film. Hall mobility strongly depends on carrier concentration and maximum mobility obtained is 18 cm2~ V~(-1) s~(-1) at a carrier concentration of 2.1 × 10~(20) cm~(-3). Optical band gap of films varied from 3.44 eV to 3 cV with the increase of zinc content in the film while the refractive index of the films at 600 nm is about 2.0.
机译:通过共溅射氧化锌和铟锡氧化物在室温下制备高导电性和透明性的非晶态锌铟锡氧化物薄膜。通过调节溅射靶的功率可以改变膜中的阳离子含量。薄膜的光透射研究表明,可见光区域的平均透射率大于85%。薄膜中Zn / In / Sn原子比为0.4 / 0.4 / 0.2时,可获得最大电导率为6×10〜2 S cm〜(-1)。霍尔迁移率很大程度上取决于载流子浓度,在载流子浓度为2.1×10〜(20)cm〜(-3)时,获得的最大迁移率为18 cm2〜V〜(-1)s〜(-1)。随着膜中锌含量的增加,膜的光学带隙在3.44 eV至3 cV之间变化,而膜在600 nm处的折射率约为2.0。

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