An evaluation of radio frequency induced power deposition with an implant model

摘要

Radio frequency (RF) induced power deposition near bare rods with different implant pathways was investigated. 3-D electromagnetic (EM) simulations were used to obtain implant models as well as RF-induced power depositions calculated as the integral of power loss density. For the investigated setups up to 50% discrepancy between the implant model predictions and EM simulation values was observed.