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The physical mechanism of dispersion caused by AlGaN/GaN buffers on Si and optimization for low dispersion

机译:AlGaN / GaN缓冲剂在Si上引起色散的物理机理和低色散的优化

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In this paper a measurement methodology, using a two-dimensional electron gas (2DEG) resistor, is used to evaluate the dispersion of three different type of buffers, namely a step graded buffer, a buffer with low temperature (LT) AlN interlayers and a superlattice buffer. Together with a dedicated Design of Experiments (DOE), these measurements allowed us to identify the physical origin of the dispersion and identify the key parts of the buffer which influence the buffer-induced dispersion of the 2DEG.
机译:在本文中,使用二维电子气体(2deg)电阻器的测量方法用于评估三种不同类型缓冲液的分散,即步进渐变缓冲液,具有低温(LT)ALN中间层和A的缓冲液超晶格缓冲器。与专用的实验设计(DOE)一起,这些测量允许我们识别分散体的物理来源,并鉴定影响2DEG的缓冲诱导的分散体的缓冲液的关键部分。

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