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Isotropic conductive paste based on epoxy with Ag coated Cu and SAC305 solder

机译:基于环氧的各向同性导电胶,涂有Ag涂层的Cu和SAC305焊料

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Isotropic conductive paste (ICP) has been continuously developed to get a good electrical performance for the semiconductor packaging applications. The conductivity of the ICP material is simply determined based on the contact between adjacent metal particles in a polymer matrix. Therefore, the mechanical shock applied on the semiconductor package can be a bad point of the adhesive strength between the substrate and polymeric matrix in the ICP material. In the present research, an isotropic conductive paste based on epoxy with Ag coated copper and solder was investigated. An isotropic conductive paste, called a hybrid Cu paste (HCP), which is composed of fluxing resin, Ag-coated Cu flakes, and solder powder, is placed between the top and bottom substrates. With increase of process temperature, the solder particles placed between the Ag coated Cu particles, as well as between the metal pads and Ag coated Cu particles, are eventually melted, thereby performing electrical interconnections through solder wetting owing to the oxide on the surface of the solder particles and metal pads being removed by the fluxing resin matrix. Specially, nano Ag coated Cu flakes was used to decrease the electrical performance as well as to keep the minimum viscosity at room temperature. After completion of curing processing, the fluxing resin is solidified due to the chemical reaction of epoxy resin. The electrical and mechanical interconnections of the hybrid Cu paste are strongly dependent on the wettability of the solder as well as by the adhesion of the resin matrix between the metal substrate and conductive filler, while that of a conventional ICA with silver particles is only determined by the shrinkage and adhesion strength of the resin matrix during processing.
机译:各向同性导电胶(ICP)一直在不断发展,以为半导体封装应用提供良好的电气性能。 ICP材料的电导率仅基于聚合物基体中相邻金属颗粒之间的接触即可确定。因此,施加在半导体封装上的机械冲击可能是ICP材料中基板与聚合物基体之间粘合强度的一个坏点。在本研究中,研究了一种基于环氧树脂,涂有银的铜和焊料的各向同性导电胶。在顶部和底部基板之间放置一个由混合助焊剂,涂有Ag的Cu薄片和焊锡粉组成的各向同性导电胶,称为混合Cu胶(HCP)。随着工艺温度的升高,放置在涂有Ag的Cu颗粒之间以及金属焊盘和涂有Ag的Cu颗粒之间的焊料颗粒最终会熔化,从而由于焊料表面的氧化物而通过焊料润湿进行电互连。助焊剂树脂基体去除了焊料颗粒和金属焊盘。特别地,使用纳米银涂层的铜片降低了电性能,并在室温下保持最小的粘度。固化处理完成后,由于环氧树脂的化学反应,助焊剂树脂固化。混合铜浆的电气和机械互连在很大程度上取决于焊料的润湿性以及金属基质与导电填料之间树脂基质的粘附性,而传统ICA与银颗粒的粘附性仅取决于加工过程中树脂基体的收缩率和粘合强度。

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