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Fluoride damage to substrates during stripping of mirrors

机译:剥离镜子时氟对基材的损坏

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Fluorides are useful low-index materials that can be used to enhance reflectivity of over-coated metallic films. In particular, YF3 has been suggested as a useful low-stress low-index material in the IR where film layers must be thicker, and it has also been found to enhance durability in silver-based mirrors. However, if these mirrors need to be stripped for recoating, care must be taken with the stripping process to avoid damaging a silica-based substrate through production of hydrofluoric acid. We present data that such damage can occur, and discuss empirically-derived alternative stripping processes in place of the normal acid-based approach to mitigate the danger.
机译:氟化物是有用的低折射率材料,可用于增强表面涂层金属膜的反射率。特别是,YF3已被建议作为IR的有用的低应力低折射率材料,在IR中膜层必须更厚,并且还发现YF3可以提高银基镜的耐用性。但是,如果需要将这些反射镜剥离以进行重新涂覆,则必须小心进行剥离过程,以免通过生产氢氟酸而损坏基于二氧化硅的基材。我们提供了可能会发生这种损坏的数据,并讨论了根据经验得出的替代剥离工艺,以代替通常的基于酸的方法来减轻这种危险。

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