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Understanding the impact of programming pulses and electrode materials on the endurance properties of scaled Ta2O5 RRAM cells

机译:了解编程脉冲和电极材料对缩放后的Ta 2 O 5 RRAM单元耐久性能的影响

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We demonstrate the strong impact of reset amplitude and duration on the endurance degradation of scaled TiNTaOTa cells, which from ab-initio and electrical switching simulation is attributed to O interaction with TiN. Clear improvements are obtained using (i) shorter write pulses, (ii) low O-affinity Ru bottom electrode, and or (iii) higher O-affinity HfO dielectric.
机译:我们证明了复位幅度和持续时间对TiNTaOTa鳞片细胞耐力下降的强烈影响,这从头开始和电开关模拟都归因于O与TiN的相互作用。使用(i)较短的写入脉冲,(ii)低O-亲和力Ru底部电极和/或(iii)较高的O-亲和力HfO电介质可获得明显的改善。

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