首页> 外文会议>IEEE Silicon Nanoelectronics Workshop >Co-dopants induced Tunnel-Current Enhancement and Their Interaction in Silicon Nano Tunnel diode
【24h】

Co-dopants induced Tunnel-Current Enhancement and Their Interaction in Silicon Nano Tunnel diode

机译:共掺杂剂诱导的隧道电流增强及其在硅纳米隧道二极管中的相互作用

获取原文

摘要

We report for ultra-thin Si tunnelling diodes that negative differential conductance (NDC) is dominated by the excess current at room temperature. This is attributed to the gap-states induced by the co-dopants in the pn junction. First-principles simulation shows that the presence of co-dopants in the pn junction region leads to an increase in the interband tunnelling current by two orders of magnitude. Furthermore co-dopants interaction plays a key role in the interband tunnelling. In the absence of dopants states in the pn junction region, raising the doping concentration at source region does not give an appreciable improvement in tunnelling current.
机译:我们报告了负差分电导(NDC)的超薄SI隧道二极管在室温下通过过量电流支配。这归因于PN结中的共掺杂剂诱导的间隙状态。第一原理模拟表明,PN结区域中的共掺杂剂的存在导致间带间隧穿电流的增加两个级别。此外,共掺杂剂交互在基间隧道中发挥着关键作用。在PN结区域中没有掺杂剂状态的情况下,提高源区的掺杂浓度不会给出隧道电流的明显改善。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号