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Ni80Fe20 V-shaped magnetic core for high performance MEMS sensors and actuators

机译:NI80FE20 V形磁芯,用于高性能MEMS传感器和执行器

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Development of integrated ferromagnetic materials structure as magnetic core is crucial for high performance MEMS sensors and actuators. A core structure is able to improve the magnetic flux linkage and concentrate the magnetic flux density in the magnetic device resulting high magnetic field generation. Previous research has utilized various ferromagnetic materials of different structures embedded into the silicon substrate as MEMS magnetic core. This paper presents fabrication of V-shaped magnetic core by anisotropic wet etching of 30 percent potassium hydroxide (KOH) at 75 oC to produce V-shaped silicon cavity structure. Filling process of Permalloy (Ni80Fe20) into the cavity is done by DC electroplating technique. Low current density of 10 mA/cm2 is used to electrodeposit Ni80Fe20 magnetic film in this study. Saccharin addition into the electrolyte composition produced a bright and crack free structure as internal stress in the electrodeposited film is reduced. This effect is essential to have good magnetic properties of the magnetic core. Thicker structure of electroplated Ni80Fe20 is observed at the sharp edges of the V-shaped cavity tip. The reason of this effect to happen is because high current flux density occurrence at those edges. From this work, fabrication of V-shaped Ni80Fe20 magnetic core has been successfully demonstrated. This magnetic core is expected to give superior magnetic performance for on chip MEMS device applications.
机译:作为磁芯的综合铁磁材料结构的研制对于高性能MEMS传感器和执行器至关重要。芯结构能够改善磁通量连杆,并集中磁性装置中的磁通密度,从而产生高磁场产生。以前的研究利用嵌入硅衬底的各种不同结构的各种铁磁材料作为MEMS磁芯。本文通过75 O c在75 O c中的氢氧化钾(KOH)的各向异性湿法蚀刻来制造V形磁芯以产生V形硅腔结构。通过直流电镀技术完成泛晶偿(Ni80Fe20)的填充过程。低电流密度为10 mA / cm 2 用于电沉积Ni80Fe20在本研究中的磁膜。添加到电解质组合物中的糖精制备了明亮且裂缝的自由结构,因为电沉积膜中的内应力降低。这种效果对于具有磁芯的良好磁性是必要的。在V形腔尖端的尖锐边缘处观察电镀Ni80Fe20的较厚结构。这种效果发生的原因是因为在那些边缘处的高电流通量密度发生。从这作用来看,已经成功地证明了V形Ni80Fe20磁芯的制造。预计该磁芯将为芯片MEMS器件应用提供卓越的磁性性能。

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