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AlGaN-based deep-UV LEDs fabricated on connected-pillar AlN buffer

机译:在连接的柱式AlN缓冲器上制造基于AlGaN的深紫外LED

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260 nm-band AlGaN deep-ultraviolet (DUV) light-emitting diodes (LED) was fabricated on a connected-pillar AlN buffer layer grown on a sapphire substrate. Low threading dislocation density (TDD) connected-pillar AlN buffer is considered to be quite effective for obtaining high internal quantum efficiency (IQE) and light-extraction efficiency (LEE) in DUV-LEDs. We fabricated an AlN pillar array structure with accurate hexagonal shape pillars grown on a patterned sapphire substrate (PSS) by using an NH3 pulsed flow multi-layer (ML) growth and an epitaxial lateral overgrowth (ELO). The AlN pillars were connected to be flat surface AlN buffer layer with low TDD, through ELO process. We fabricated AlGaN quantum well (QW) DUV-LED on a connected-pillar AlN buffer. The output power obtained was 5.5 mW for 265 nm LED measured under room temperature cw operation.
机译:在蓝宝石衬底上生长的连接柱状AlN缓冲层上制造了260 nm波段的AlGaN深紫外(DUV)发光二极管(LED)。低螺纹位错密度(TDD)连接的柱状AlN缓冲区被认为对于在DUV-LED中获得高内部量子效率(IQE)和光提取效率(LEE)十分有效。通过使用NH 3 脉冲流多层(ML)生长和外延横向过生长(ELO),我们制造了具有在六边形蓝宝石衬底(PSS)上生长的精确六边形柱的AlN柱阵列结构。 。通过ELO工艺将AlN柱连接为具有低TDD的平坦表面AlN缓冲层。我们在连接的柱式AlN缓冲器上制造了AlGaN量子阱(QW)DUV-LED。在室温cw操作下测得的265 nm LED的输出功率为5.5 mW。

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