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Reliability of graphene interconnects and n-type doping of carbon nanotube transistors

机译:石墨烯互连的可靠性和碳纳米管晶体管的n型掺杂

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Graphene and carbon nanotubes (CNTs) have gained significant attention due to their potential applications in high performance electronics. In order to replace or integrate the current silicon based technology with carbon based electronics one should study the reliability of those devices to understand the feasibility of their applications. In this report we present the reliability of CVD synthesized graphene for transistor interconnects and also investigate the reliability of a metal-oxide based CNT doping technique that is an active area of research in the current CNT community.
机译:石墨烯和碳纳米管(CNTs)由于其在高性能电子学中的潜在应用而备受关注。为了将当前的基于硅的技术替换为基于碳的电子产品或与之集成,人们应该研究那些设备的可靠性,以了解其应用的可行性。在本报告中,我们介绍了用于晶体管互连的CVD合成石墨烯的可靠性,并研究了基于金属氧化物的CNT掺杂技术的可靠性,这是当前CNT界研究的一个活跃领域。

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