首页> 外文会议>Conference on optical systems design >2D simulation for the impact of edge effects on the performance of planar InGaAs/InP SPADs
【24h】

2D simulation for the impact of edge effects on the performance of planar InGaAs/InP SPADs

机译:边缘效应对平面InGaAs / InP SPAD性能的影响的2D模拟

获取原文

摘要

InGaAs/InP SPADs are solid-state devices able to detect near-infrared single photons up to 1700 nm. The pn junction is defined by Zn diffusions in a lightly n-doped InP layer. If a simple Zn diffusion were employed, it would suffer edge effects; therefore a double diffusion is used in order to smooth the electric field at the periphery of the active area. However, since most of the main parameters of the SPAD depend on the electric field profile, it is of outmost importance to properly evaluate the electric field, both in the active area and at its periphery. Currently-available programs for 2D simulations require heavy and long computations and are not tailored for SPAD performance assessment, thus often 1D custom simulation is performed for qualitative evaluation of "detection" characteristics. We present two 1D and 2D device simulators designed for InGaAs/InP SPAD detectors and the models we implemented therein. We compare the differences in the results between the 1D and 2D approaches in terms of electric field profile, breakdown voltage, trigger efficiency and dark count rates. The ID simulator overestimates breakdown voltage by few percent, while the 2D simulator matches the measured values. We show how trigger efficiency is not constant in the device and how the high electric field near the edges contributes to increase the dark count rate due to tunneling effects.
机译:InGaAs / InP SPAD是能够检测高达1700 nm的近红外单光子的固态设备。 pn结由轻度n掺杂InP层中的Zn扩散定义。如果采用简单的Zn扩散,则会受到边缘效应的影响。因此,为了使有源区周围的电场平滑,使用了双重扩散。但是,由于SPAD的大多数主要参数取决于电场分布,因此正确评估有源区域及其外围的电场至关重要。当前可用于2D仿真的程序需要大量且漫长的计算,并且不适合SPAD性能评估,因此通常会执行1D自定义仿真以对“检测”特性进行定性评估。我们介绍了两个分别为InGaAs / InP SPAD检测器设计的1D和2D设备模拟器以及我们在其中实现的模型。我们比较一维和二维方法在电场分布,击穿电压,触发效率和暗计数率方面的结果差异。 ID模拟器过高估计了百分之几的击穿电压,而2D模拟器则匹配测量值。我们展示了器件中的触发效率如何不是恒定的,以及由于隧穿效应,边缘附近的高电场如何促进暗计数率的提高。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号