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Arsenic sulfide layers for dielectric reflection mirrors prepared from solution

机译:用于由溶液制备的介电反射镜的砷硫化物层

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Chalcogenide materials due to high refractive indices, transparency in the mid-IR spectral region, nonlinear refractive indices, etc, have been employed as fibers and films in different photonic devices such as light amplifiers, optical regenerators, broadband radiation sources, etc. Chalcogenide films can be prepared by physical methods as well as by solution-based techniques in which solutions of chalcogenides in amines are used. This paper presents results on the solution-based fabrication and optical characterization of single arsenic sulfide layers and multilayer stacks consisting of alternating As_2S_3 layers and porous silica layers and coated on planar and fiber-optic substrates. Input As_2S_3 solutions for the layer fabrications were prepared by dissolving As_2S_3 powder in n-propylamine in a concentration of 0.50 mol/l. These solutions were applied on glass slides by dip-coating method and obtained layers were thermally treated at temperatures up to 180 °C. Similar procedure was used for As_2S_3 layers in multilayer stacks which were fabricated by repeating the application of one As_2S_3 layer and one porous silica layer onto glass slides by dip-coating method. The same approach was used for the preparation of the stack on a silica fiber (a diameter of 0.3 mm). It has been found that the thermal treatment of the applied layers has to be carefully controlled in order to obtain stacks with three pairs of such layers. Single arsenic and porous silica layers were characterized by optical microscopy, and by measuring their transmission spectra in a range of 200-2500 nm. Thicknesses and refractive indices were estimated from the spectra. Transmission spectra of planar multilayer stacks were measured, too. Interference bands in a spectral range of 400-900 nm have been observed in transmission spectra of the multilayer stacks with a minimum transmittance of about 50% which indicates the possibility of using such stacks as reflecting mirrors.
机译:硫族化物材料,由于高折射率,透明性在中红外光谱区域,非线性折射率等,已被用作纤维和薄膜在不同光子器件诸如光放大器,光再生器,宽带辐射源等硫属化物膜可通过物理方法,以及通过基于溶液的技术,其中使用了在硫属化物的胺的溶液来制备。本文呈现的基于溶液的制造和单硫化物砷层和多层堆叠由交替As_2S_3层和多孔二氧化硅层的光学特性的结果,并涂覆在平坦的和光纤的基板。用于层捏造输入As_2S_3溶液通过在0.50摩尔/升的浓度As_2S_3粉末溶解在正丙胺制备。这些溶液通过浸涂方法在载玻片上涂布和获得层在温度下热处理至180℃。类似的方法,其中使用通过重复一个As_2S_3层,并通过浸涂法一个多孔二氧化硅层在载玻片上的应用在制造多层叠层As_2S_3层。用于堆叠的上二氧化硅纤维(直径为0.3mm)的制备相同的方法。已经发现,所施加的层的热处理必须以获得叠层有三对这样的层被小心地控制。单砷和多孔二氧化硅层,其特征在于用光学显微镜,并且通过测量的范围为200-2500纳米其透射光谱。厚度和折射率从光谱估计。平面多层堆叠的透射光谱进行测定,太。在400-900纳米的光谱范围内干涉带已结合的约50%的最小透射率,其指示使用这种堆叠作为反射镜的可能性多层叠层的透射光谱中观察到。

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