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A Piezoresistive Pressure Sensor with Improved Sensitivity in Low Pressure Condition

机译:压阻式压力传感器,具有改善的低压条件灵敏度

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In this paper, a high sensitive piezoresistive pressure sensor is designed, fabricated and characterized. The designed structure is composed of 4 diagrams separated by two crossed thick beams. There are two piezoresistors located at two ends of the beam, which are used to measure the largest stress in the structure during stressed. Four piezoresistors are connected into a Wheatstone Bridge. The crossed thick beams are covered with a 2μm thick Al layer resulting more residual stress on piezoresistors. This structure has shown improved sensor sensitivity in low pressure condition. The sensor is characterized under the pressure ranges from 5-400hPa. As a reference, a conventional flat membrane pressure sensor is also fabricated. The testing results show that the sensitivity of crossed beam structure is 32.9 μV/hPa, which is 3.8 times higher than that of the conventional structure. Finally, the stress simulation results of the crossed beam membrane (CBM) and the conventional flat membrane (CFM) are given to verify the testing results.
机译:在本文中,设计了高敏感的压阻压力传感器,制造和表征。设计的结构由由两个交叉的厚梁分开的4个图组成。有两个压电电阻器位于梁的两端,用于在压力期间测量结构中的最大应力。四个压阻器连接到惠斯通桥中。交叉的厚梁被2μm厚的Al层覆盖,导致压阻器上的更多残余应力。该结构在低压条件下显示了改善的传感器灵敏度。传感器的特征在于5-400HPa的压力范围。作为参考,还制造了传统的扁平膜压力传感器。测试结果表明,交叉光束结构的灵敏度为32.9μV/ HPA,比传统结构高3.8倍。最后,给出了交叉梁膜(CBM)和传统的扁平膜(CFM)的应力模拟结果以验证测试结果。

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