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Fabrication and Gas-Sensing Characterization of Molybdenum Oxide Nanostructure by Reactive RF Sputtering

机译:反应性射频溅射法制备氧化钼纳米结构及其气敏特性

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Molybdenum oxide (MoOx) is an interesting metal oxide with promising properties for applications in the field of catalysts and chemical sensors. Its characteristics could be significantly enhanced by forming nanostructures. Recently, MoOx nanostructures, including nanobelt and nanorod prepared by thermal evaporation, chemical syntheses and sputtering have been reported. Sputtering is a practical method for MoOx nanostructure synthesis because it is a low temperature, well-controlled and IC-compatible process. However, the structure of MoOx material prepared by sputtering techniques is strongly depending process condition and thus far there has been no systematic investigation of the sputtering parameters on MoOx structure. In this work, suitable sputtering conditions for the formation MoOx nanostructures are studied and the MoOx thin films prepared under different condition are tested toward ethanol, acetone gas sensing. Sputtering pressure, radio frequency (rf) power and argon to oxygen flow ratio are systematically varied in the range of 2x10-3- 8x 10-3 mbar, 200 W and 1:2 to 1:4, respectively. It was found that molybdenum oxide nano-needle tend to form at high argon to oxygen ratio of 1:4 and rf power 200 W. Under these conditions, MoOx nano-needles are formed with different length ranging from 0.2-0.5 um. In addition, MoOx nano-needles are highly crystalline with MoO3 Orthorhombic crystal phase. Gas-sensing performances of sputtered molybdenum oxide nano-needle thin film have been characterized toward ethanol and acetone sensing. It was found that molybdenum oxide thin films exhibit ntype conductivity with decreased resistance when exposed to ethanol and acetone, which are reducing gases. In addition, the molybdenum oxide thin films are capable of detecting ethanol and acetone gases at concentrations lower than 100 and 200 ppm, respectively at operating temperature 400 °C.
机译:氧化钼(MoOx)是一种有趣的金属氧化物,具有广阔的应用前景,可用于催化剂和化学传感器领域。通过形成纳米结构可以显着增强其特性。近来,已经报道了MoOx纳米结构,包括通过热蒸发,化学合成和溅射制备的纳米带和纳米棒。溅射是一种用于MoOx纳米结构合成的实用方法,因为它是一种低温,可控且与IC兼容的工艺。然而,通过溅射技术制备的MoOx材料的结构在很大程度上取决于工艺条件,因此到目前为止,还没有对MoOx结构上的溅射参数进行系统的研究。在这项工作中,研究了适合形成MoOx纳米结构的溅射条件,并测试了在不同条件下制备的MoOx薄膜对乙醇,丙酮气体的敏感性。溅射压力,射频(rf)功率和氩氧流比分别在2x10-3-8x 10-3 mbar,200 W和1:2至1:4的范围内系统地变化。已发现,在高的氩气与氧气的比例为1:4且射频功率为200 W的情况下,容易形成氧化钼纳米针。此外,MoOx纳米针与MoO3正交晶相高度结晶。溅射氧化钼纳米针薄膜的气敏性能已针对乙醇和丙酮进行了表征。发现当暴露于乙醇和丙酮(它们是还原性气体)时,氧化钼薄膜表现出n型导电性,并且电阻降低。此外,氧化钼薄膜能够在400°C的工作温度下分别检测浓度低于100和200 ppm的乙醇和丙酮气体。

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