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(Ga,N) and (Cu,Ga) Co-doped ZnO films for Improving Photoelectrochemical Response for Solar Driven Hydrogen Production

机译:(Ga,N)和(Cu,Ga)共掺杂的ZnO薄膜用于改善光致电化学响应以产生太阳能

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In this study, Bandgap-reduced p-type ZnO thin films were synthesized through Cu and Ga co-doping. The ZnO:(Cu,Ga) films were synthesized by RF magnetron sputtering in O_2 gas ambient at room temperature and then annealed at 500°C in air for 2 hours. We found that the carrier concentration tuning does not significantly change the bandgap and crystallinity of the ZnO:Cu films. However, it can optimize the carrier concentration and thus dramatically enhance PEC response for the bandgap-reduced p-type ZnO thin films. The co-doped ZnO:(Ga,N) films were deposited by co-sputtering at room temperature, followed by post-annealing at 500°C. We found that the ZnO:(Ga,N) films exhibited greatly enhanced crystallinity compared to ZnO:N films doped with pure N. Furthermore, the ZnO:(Ga,N) films showed much higher N-incorporation than ZnO:N films. As a result, the ZnO:(Ga,N) films showed significantly higher photocurrents than ZnO:N films.
机译:在这项研究中,通过铜和镓的共掺杂合成了带隙减少的p型ZnO薄膜。 ZnO:(Cu,Ga)薄膜是通过RF磁控溅射在室温O_2气体中合成的,然后在500°C的空气中退火2小时。我们发现载流子浓度调节不会显着改变ZnO:Cu膜的带隙和结晶度。但是,它可以优化载流子浓度,从而显着增强带隙减小的p型ZnO薄膜的PEC响应。通过在室温下共溅射沉积共掺杂的ZnO:(Ga,N)薄膜,然后在500°C下进行后退火。我们发现,与掺杂纯N的ZnO:N薄膜相比,ZnO:(Ga,N)薄膜的结晶度大大提高。此外,ZnO:(Ga,N)薄膜的N掺入量比ZnO:N薄膜高得多。结果,ZnO:(Ga,N)膜显示的光电流明显高于ZnO:N膜。

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