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(Ga,N) and (Cu,Ga) Co-doped ZnO films for Improving Photoelectrochemical Response for Solar Driven Hydrogen Production

机译:(Ga,N)和(Cu,Ga)共掺杂的ZnO膜,用于改善太阳驱动氢气产生的光电化学响应

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In this study, Bandgap-reduced p-type ZnO thin films were synthesized through Cu and Ga co-doping. The ZnO:(Cu,Ga) films were synthesized by RF magnetron sputtering in O_2 gas ambient at room temperature and then annealed at 500°C in air for 2 hours. We found that the carrier concentration tuning does not significantly change the bandgap and crystallinity of the ZnO:Cu (films. However, it can optimize the carrier concentration and thus dramatically enhance PEC response for the bandgap-reduced p-type ZnO thin films. The co-doped ZnO:(Ga,N) films were deposited by co-sputtering at room temperature, followed by post-annealing at 500°C. We found that the ZnO:(Ga,N) films exhibited greatly enhanced crystallinity compared to ZnO:N films doped with pure N. Furthermore, the ZnO:(Ga,N) films showed much higher N-incorporation than ZnO:N films. As a result, the ZnO:(Ga,N) films showed significantly higher photocurrents than ZnO:N films.
机译:在该研究中,通过Cu和Ga共掺杂合成带隙还原的p型ZnO薄膜。通过在室温下通过O_2气体环境中的RF磁控管溅射合成ZnO:(Cu,Ga)膜,然后在空气中在500℃下退火2小时。我们发现载流子浓度调谐不会显着改变ZnO:Cu(薄膜的带隙和结晶度。然而,它可以优化载体浓度,从而显着提高带隙减少的p型ZnO薄膜的PEC响应。该通过在室温下溅射沉积共掺杂的ZnO:(Ga,N)薄膜,然后在500℃下进行后退火。我们发现ZnO:(Ga,N)薄膜与ZnO相比表现出极大的结晶度:N掺杂有纯N的N膜。此外,ZnO:(Ga,N)薄膜显示出比ZnO:N薄膜更高的N-掺入。结果,ZnO:(Ga,N)薄膜显示出比ZnO显着更高的光电流:N电影。

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    《ECS Meeting》|2011年||共10页
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    Sudhakar Shet;

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  • 中图分类 TG17-532;
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