首页> 外文会议>Nanoelectronics Conference (INEC), 2010 >In-situ synchrotron X-ray diffraction measurement of epitaxial FeRh thin films
【24h】

In-situ synchrotron X-ray diffraction measurement of epitaxial FeRh thin films

机译:外延FeRh薄膜的原位同步加速器X射线衍射测量

获取原文

摘要

The magnetic properties and structure of FeRh thin film epitaxially grown onto MgO(001) substrate were studied by MPMS(Magnetic Properties Measure System) and in-situ temperature synchrotron XRD(X-ray Diffraction). The transition temperature of FeRh thin films was around 380 K. Both M-T curve and d-spacing changes correspond to each other very closely. Abrupt changes in the lattice constants can be observed from the in-situ analysis. Also, there is the likelihood of existence of a new phase.
机译:利用MPMS(磁性能测量系统)和原位温度同步加速器XRD(X射线衍射)研究了外延生长在MgO(001)衬底上的FeRh薄膜的磁性能和结构。 FeRh薄膜的转变温度约为380K。M-T曲线和d间距变化非常紧密地对应。从原位分析可以观察到晶格常数的突然变化。而且,存在新阶段的可能性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号