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Single event transient pulse width measurements in a 65-nm bulk CMOS technology at elevated temperatures

机译:在高温下采用65 nm体CMOS技术进行单事件瞬态脉冲宽度测量

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Soft errors are fast becoming a significant reliability issue for advanced technologies due to lower drive currents and higher operating frequencies. Single-event transients (SETs), a precursor for soft errors, show a strong dependence on operating temperature. In this work, heavy-ion induced SET pulse widths measured in a 65-nm bulk CMOS technology at temperatures ranging from 25° to 100°C with an autonomous SET capture circuit are presented. Experimental results for SETs induced in an inverter chain indicate an increase in average SET pulse width as a function of operating temperature. Unique SET test structures were also designed to differentiate between SETs induced in an nMOS transistor and those induced in a pMOS transistor. SET widths induced in a pMOS transistor increase more with temperature than SETs induced in an nMOS transistor.
机译:由于较低的驱动电流和较高的工作频率,软错误已迅速成为高级技术的重要可靠性问题。单事件瞬变(SET)是软错误的先兆,显示出对工作温度的强烈依赖性。在这项工作中,提出了使用自主SET捕获电路,在65nm体CMOS技术中在25°至100°C的温度范围内测得的重离子诱导的SET脉冲宽度。逆变器链中感应的SET的实验结果表明,平均SET脉冲宽度随工作温度的增加而增加。还设计了独特的SET测试结构,以区分在nMOS晶体管中感应的SET和在pMOS晶体管中感应的SET。与在nMOS晶体管中感应的SET相比,在pMOS晶体管中感应的SET宽度随温度增加更多。

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