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High-speed microlithography aerial image contour generation without images

机译:无需图像的高速微光刻航拍图像轮廓生成

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To evaluate the quality of microlithography result, massive aerial images are often generated for careful inspection using applications such as OPC LCC (Lithography Compaliance Check). The number of the pixels used in a 2D aerial image is in the order of O(n * n), where n is the image resolution, which means the runtime scales in a n~2 fashion. However, most of the quality indexes such as CDs or EPE (Edge Placement Error) can be readily observed using contours only and the number of pixels in a specific contour is around O(n) in general. Therefore, there is a huge waste (at least O(n)) of both computation time and memory in most microlithography aerial image simulation tools. The question is: "how to compute an image contour without explicitly generate images?". In this paper, we show that it is indeed feasible to know the image contour with an explicit image formation. The concept is to represent the image in an implicit way. In our algorithm, we utilize hierarchical region-wise function such as 2D polynomials to fit the aerial image kernels instead of using a bitmap type fit. Therefore, any LUT (Look-up-table) operation can be transformed into a polynomial look up and mathematical operations. Since there are only additive and subtractive operations during aerial image generation, we only need to apply same operations to the polynomial coefficients. Once the LUT operation is done, we have analytical forms of the light intensity in each region. To know the contour at each region, we only need to solve a local 2D polynomial equation. With these simple forms, the equation solution can be performed with great efficiency. Furthermore, due to the hierarchical structure, we can reduce the search time from 0(m~*m) to O(m logm), where m is the number of regions. Further speed up is achieved this way. Finally, our algorithm also does not suffer from increased feature count caused by the feature size reduction between process nodes because once the regional polynomial representation is complete, no future LUT search is necessary. Therefore, the runtime of our algorithm is significantly faster than the traditional image LUT method. The initial experiment demonstrates over hundreds of times speed up over the traditional LUT methods.
机译:为了评估微光刻结果的质量,通常会使用诸如OPC LCC(光刻兼容性检查)之类的应用生成大量的航拍图像以进行仔细检查。 2D航空图像中使用的像素数约为O(n * n),其中n是图像分辨率,这意味着运行时以n〜2的方式缩放。但是,大多数质量指标(例如CD或EPE(边缘放置错误))仅使用轮廓即可轻松观察到,特定轮廓中的像素数通常约为O(n)。因此,在大多数微光刻航空图像仿真工具中,计算时间和内存都存在巨大浪费(至少O(n))。问题是:“如何在不显式生成图像的情况下计算图像轮廓?”。在本文中,我们表明知道具有显式图像形成的图像轮廓确实是可行的。概念是用隐式方式表示图像。在我们的算法中,我们利用分层的区域功能(例如2D多项式)来拟合航空图像内核,而不是使用位图类型拟合。因此,任何LUT(查找表)运算都可以转换为多项式查找和数学运算。由于在航空影像生成过程中只有加法和减法运算,因此我们只需要对多项式系数应用相同的运算。 LUT操作完成后,我们将获得每个区域中光强度的分析形式。要知道每个区域的轮廓,我们只需要求解局部2D多项式方程。通过这些简单的形式,可以高效地执行方程式解。此外,由于层次结构,我们可以将搜索时间从0(m〜* m)减少到O(m logm),其中m是区域数。通过这种方式可以进一步提高速度。最后,我们的算法也不会因为过程节点之间的特征尺寸减小而导致特征计数增加,因为一旦完成了区域多项式表示,就不再需要将来的LUT搜索。因此,我们的算法的运行时间比传统的图像LUT方法要快得多。初始实验表明,与传统的LUT方法相比,速度提高了数百倍。

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