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High-Temperature Operation of 50 A (1600 A/cm~2), 600 V 4H-SiC Vertical-Channel JFETs for High-Power Applications

机译:适用于大功率应用的50 A(1600 A / cm〜2),600 V 4H-SiC垂直沟道JFET的高温操作

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In this work we have demonstrated the high-temperature operations of 600 V/50 A 4H-SiC vertical-channel junction field-effect transistors (VJFETs) with an active area of 3 mm~2. Specific-on resistance (R_(ONSP)) in the linear region of a single die is less than 2.6 mΩ.cm~2 while the drain-source current is over 50 A under a gate bias (V_(GS)) of 3 V. A reverse blocking gain of 54 is obtained at gate bias ranging from -13 V to -23 V and drain-source leakage current (I_(RDS)) of 200 μA. To demonstrate the use of SiC VJFETs for high-power applications, eight 3 mm~2 SiC VJFETs are bonded in a high current 600-V module. Ronsp in the linear region of these eight-paralleled SiC VJFETs is 2.8 mΩ.cm~2 at room temperature and increased to 5.35 mΩ.cm~2 at an ambient temperature of 175 °C in air, corresponding to a shift of 0.61%/°C from room temperature to 175 °C. Meanwhile, the forward current is over 360 A at room temperature and reduces to 188 A at 175 °C at drain-source bias (V_(DS)) of 5.25 V and V_(GS) of 3 V.
机译:在这项工作中,我们展示了600 V / 50 A 4H-SiC垂直沟道结型场效应晶体管(VJFET)在3 mm〜2的有效面积下的高温工作。在3 V的栅极偏置电压(V_(GS))下,单个管芯线性区域中的导通电阻(R_(ONSP))小于2.6mΩ.cm〜2,而漏源电流超过50A。在-13V至-23V的栅极偏置电压和200μA的漏源漏电流(I_(RDS))时,可获得54的反向阻断增益。为了演示SiC VJFET在大功率应用中的使用,将八个3 mm〜2 SiC VJFET结合在一个大电流600-V模块中。这些八平行SiC VJFET的线性区域中的Ronsp在室温下为2.8mΩ.cm〜2,在空气中环境温度为175°C时上升到5.35mΩ.cm〜2,对应于0.61%/从室温到175°C。同时,正向电流在室温下超过360 A,在漏源偏置(V_(DS))为5.25 V和V_(GS)为3 V的情况下,在175°C时降至188A。

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