首页> 外文会议>Photovoltaic Specialists Conference (PVSC), 2009 >Triple junction InGaP/GaAS/Ge solar cell optimization: The design parameters for a 36.2 efficient space cell using Silvaco ATLAS modeling on6; simulation
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Triple junction InGaP/GaAS/Ge solar cell optimization: The design parameters for a 36.2 efficient space cell using Silvaco ATLAS modeling on6; simulation

机译:三结InGaP / GaAS / Ge太阳能电池优化:使用Silvaco ATLAS建模6的效率为36.2%的空间电池的设计参数;模拟

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This paper presents the design parameters for a triple junction InGaP/GaAs/Ge space solar cell with a simulated maximum efficiency of 36.28% using Silvaco ATLAS Virtual Wafer Fabrication tool. Design parameters include the layer material, doping concentration, and thicknesses. An initial dual junction InGaP/GaAs model of a known Japanese solar cell was constructed in Silvaco ATLAS to an accuracy of less than 2% with known experimental Voc and Jsc performance results, validating the use of computer modeling to accurately predict solar cell performance. Once confidence of the model's meshing, material property statements, model statements, light file, and numerical methods were established, only the layer doping concentration levels and thicknesses were modified in order to improve the cell's power out efficiency. Simulations of the dual junction cell began by first changing only the doping concentrations and thicknesses to the values obtained from previous work using a genetic algorithm which showed a 0.6% increase in efficiency. Further improvements to the genetic algorithm design parameters showed an overall increase of 0.83% efficiency. Next, a triple junction InGaP/GaAs/Ge cell was modeled by adding a Ge layer to the validated dual junction InGaP/GaAs model. (The triple junction model could not be validated due to lack of published experimental data.) Applying the same process showed increased power output for the triple junction cell. The additional improvement to the genetic algorithm design parameters was principally based on the knowledge that the top InGaP layer is the current limiting layer. Hence, the top layer thickness was maximized until middle and bottom layer shadowing effects began to decrease power output. Over 250 simulations were performed and recorded. Maximum doping concentrations used real world limitations of 5e19 cm-3 for InGaP and GaAs and 3e18 cm-3 for Ge for all simulations. This process produc-ed the design parameters for a 36.28% efficient triple junction solar cell. A provisional patent has been filed for this design.
机译:本文介绍了使用Silvaco ATLAS虚拟晶圆制造工具模拟的最大效率为36.28%的三结InGaP / GaAs / Ge空间太阳能电池的设计参数。设计参数包括层材料,掺杂浓度和厚度。在Silvaco ATLAS中建立了一个已知日本太阳能电池的初始双结InGaP / GaAs模型,其准确度低于2%,并且具有已知的V oc 和J sc 性能结果,验证了使用计算机模型来准确预测太阳能电池的性能。一旦建立了模型的网格划分,材料属性陈述,模型陈述,光文件和数值方法的置信度,则仅修改层掺杂浓度水平和厚度以提高电池的断电效率。通过首先将掺杂浓度和厚度更改为使用遗传算法从先前工作中获得的值开始对双结电池进行仿真,该遗传算法显示出效率提高了0.6%。遗传算法设计参数的进一步改进表明整体效率提高了0.83%。接下来,通过将Ge层添加到已验证的双结InGaP / GaAs模型中,对三结InGaP / GaAs / Ge电池进行建模。 (由于缺乏公开的实验数据,无法验证三结模型。)应用相同的过程显示出三结电池的功率输出增加。遗传算法设计参数的其他改进主要基于以下知识,即顶层InGaP层是电流限制层。因此,顶层的厚度被最大化,直到中层和底层的阴影效应开始降低功率输出为止。进行并记录了250多次仿真。在所有模拟中,InGaP和GaAs的最大掺杂浓度均使用5e19 cm -3 的实际限制,Ge使用3e18 cm -3 的实际限制。这个过程产生了 ed设计了效率为36.28%的三结太阳能电池的设计参数。该外观设计已申请了临时专利。

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