In this work, we have studied the scalability of our fabrication process for heterojunction solar cells up to 148.5 cm2 total area. Double heterojunction devices were fabricated on both n- and p-type textured substrates using only doped (n) and (p) a-Si:H layers. ITO was used as anti-reflective coating and evaporated Aluminum as the metallic back contact. Finally, an Ag grid was screen-printed at the front side. Efficiencies higher than 16% have been obtained in both cases demonstrating the homogeneity and robustness of our fabrication process for larger substrates. Nevertheless, there is still room for improvement especially in terms of passivation, the Voc values are still low (<640 mV), though it is a promising result considering that no intrinsic layer has been used.
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机译:在这项工作中,我们研究了异质结太阳能电池制造工艺的可扩展性,其总面积可达148.5 cm 2 sup>。仅使用掺杂的(n)和(p)a-Si:H层在n型和p型纹理化衬底上制造了双异质结器件。 ITO用作抗反射涂层,蒸发的铝用作金属背触点。最后,在正面丝网印刷了一个Ag网格。在这两种情况下,都获得了高于16%的效率,这证明了我们用于大型基板的制造过程的均质性和耐用性。尽管如此,特别是在钝化方面仍有改进的空间,尽管考虑到没有使用本征层,这是一个很有希望的结果,但V oc sub>值仍然很低(<640 mV)。
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