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Hydrothermally Grown Single-Crystalline Zinc Oxide; Characterization and Modification

机译:热液生长的单晶氧化锌;表征与修改

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An overview of our recent results on characterization and modification of high-resistivity n-type bulk zinc oxide samples, grown by hydrothermal techniques, is given. Three specific topics are addressed; (i) the role of lithium (Li) as an electrically compensating impurity, (ii) extrinsic n-type doping by hydrogen implantation, and (iii) influence of annealing conditions on deep band emission. In (i), furnace annealing of as-grown samples at temperatures above ~800 °C is shown to cause out-diffusion of residual Li impurities and concurrently, the resistivity decreases. After annealing at 1400 °C, a resistivity close to 10~(-1) Ωcm is obtained and the Li content is reduced from above 10~(17) cm~(-3) to the mid 10~(15) cm~(-3) range, providing evidence for the crucial role of Li as an electrically compensating impurity. For ion-implanted samples, vacancy clusters evolve during post-implant flash lamp annealing (20 ms duration) and these clusters appear to trap and deactivate Li with a resulting improvement of the n-type conductivity. However, these clusters have a limited stability and start to dissociate already after 1h at 900 °C, accompanied by a decrease in the conductivity. For topic (ii), n-type doping by hydrogen implantation is shown to enhance the conductivity by about 5 orders of magnitude already in the as-implanted state. Despite substantial loss of hydrogen, the conductivity remains stable, or even increases, after annealing up to ≥600 °C, and necessary conditions for doping by hydrogen are discussed. In (iii), the origin of the commonly observed deep band emission from monocrystalline zinc oxide is investigated using a concept of annealing as-grown samples in different atmospheres. A strong influence by the atmosphere and temperature is observed and the results can be interpreted in terms of dominant effects on the emission by vacancy-related defects.
机译:概述了我们最近对通过水热技术生长的高电阻率n型块状氧化锌样品的表征和改性的结果。涉及三个具体主题; (i)锂(Li)作为电补偿杂质的作用;(ii)通过氢注入进行的非本征n型掺杂;以及(iii)退火条件对深带发射的影响。在(i)中,显示在〜800°C以上的温度下对已生长的样品进行炉内退火会导致残留的Li杂质向外扩散,同时电阻率会降低。在1400°C退火后,电阻率接近10〜(-1)Ωcm,Li含量从10〜(17)cm〜(-3)以上降低到中间的10〜(15)cm〜( -3)范围,为锂作为电补偿杂质的关键作用提供了证据。对于离子注入样品,空位簇在注入后闪光灯退火(持续时间为20 ms)期间演化,并且这些簇似乎捕获和钝化了Li,从而改善了n型电导率。但是,这些团簇的稳定性有限,在900°C下放置1小时后已经开始解离,同时电导率也随之降低。对于主题(ii),已显示通过氢注入进行的n型掺杂已经在注入后的状态下将电导率提高了约5个数量级。尽管有大量的氢损失,但在退火至≥600°C后,电导率仍保持稳定,甚至增加,并讨论了用氢进行掺杂的必要条件。在(iii)中,使用退火的样品在不同的气氛中进行退火的概念,研究了通常观察到的来自单晶氧化锌的深谱带发射的起源。观察到了大气和温度的强烈影响,结果可以用空位相关缺陷对发射的显性影响来解释。

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