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Commercial Viability of a Merged HBT-FET (BiFET) Technology for GaAs Power Amplifiers

机译:用于GaAs功率放大器的合并HBT-FET(BiFET)技术的商业可行性

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This paper covers the history and recent developments of GaAs BiFETs in commercial high volume GaAs HBT manufacturing environment. Further more, the paper also goes into "merged/stacked" FET-HBT integration schemes and their impacts on cost, yield and cycle time. Various circuit applications such as stage bypassing, attenuators, advanced bias circuit controls etc., that are realized in both BiFET approaches are also reviewed to show the commercial success of BiFET process technology. The challenges in using stacked FET-HBT geometry for an integrated transmit/receive switch and an alternative approach of utilizing advanced multi-chip module (MCM) techniques to deliver the same level of functionality in the smallest possible form-factor are examined with an emphasis on functional test yield and fabrication process yield.
机译:本文介绍了在商业大批量GaAs HBT制造环境中GaAs BiFET的历史和最新发展。此外,本文还探讨了“合并/堆叠”的FET-HBT集成方案及其对成本,良率和周期时间的影响。还回顾了两种BiFET方法中实现的各种电路应用,例如级旁路,衰减器,高级偏置电路控制等,以显示BiFET工艺技术的商业成功。重点研究了使用堆叠式FET-HBT几何结构集成发射/接收开关的挑战以及利用先进的多芯片模块(MCM)技术以最小的外形尺寸提供相同级别功能的替代方法。功能测试良率和制造工艺良率。

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