首页> 外文会议>Conference on Optoelectronic Materials and Devices; 20071102-05; Wuhan(CN) >Multiplication Characteristics of InP/InGaAs Avalanche Photodiodes with Thick Multiplication and Charge Layers
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Multiplication Characteristics of InP/InGaAs Avalanche Photodiodes with Thick Multiplication and Charge Layers

机译:具有厚倍增层和电荷层的InP / InGaAs雪崩光电二极管的倍增特性

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In this report, the multiplication characteristics of InP/InGaAs avalanche photodiode (APD) with thick multiplication and charge layer have been studied theoretically and experimentally, considering the electric field distribution, carrier concentration, and different multiplication layer thickness. We find that ionization in the charge layer is very sensitive to avalanche multiplication (M) and breakdown voltage (V_(br))- Partial ionization in the charge layer has been suggested, which gives a good description of experimental results.
机译:在此报告中,在理论和实验上,考虑了电场分布,载流子浓度和不同的倍增层厚度,对具有厚倍增和电荷层的InP / InGaAs雪崩光电二极管(APD)的倍增特性进行了研究。我们发现电荷层中的电离对雪崩倍增(M)和击穿电压(V_(br))非常敏感-已提出电荷层中的部分电离,这对实验结果提供了很好的描述。

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