首页> 外文会议>Proceedings of ISES Solar World Congress 2007: Solar Energy and Human Settlement >ELECTRICAL PROPERTIES OF DOPED SnS THIN FILMS PREPARED BY VACUUM EVAPORATION
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ELECTRICAL PROPERTIES OF DOPED SnS THIN FILMS PREPARED BY VACUUM EVAPORATION

机译:真空蒸发制备的掺杂SnS薄膜的电学性能

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Tin sulfide (SnS) has received much attention because of its high absorption coefficient, suitable band-gap and little toxicity. In this paper, doped-SnS thin films were fabricated by vacuum evaporation. Sb, Sb2O3, Se, Te, In, In2O3, Se and In2O3 were used as dopant sources. The thickness and conductance of various doped-SnS thin films were measured, and then the resistivities and the ratio of photo-conductivity to dark-conductivity (Gphoto/Gdark) of these films were calculated. From the experimental results, Sb is the best dopant source. The resistivity of Sb doped-SnS thin film is reduced by four orders of magnitude and the value of Gphoto/Gdark is double. In addition, the influence of Sb doping content on the electrical properties of doped-SnS thin films was also investigated, and the optimum doping content of Sb is 1.3%~1.5% in weight.
机译:硫化锡(SnS)因其高吸收系数,合适的带隙和低毒性而备受关注。本文采用真空蒸发法制备了SnS掺杂薄膜。 Sb,Sb2O3,Se,Te,In,In2O3,Se和In2O3用作掺杂源。测量各种掺杂的SnS薄膜的厚度和电导率,然后计算这些薄膜的电阻率和光电导率与暗导率之比(Gphoto / Gdark)。从实验结果来看,Sb是最好的掺杂源。掺Sb的SnS薄膜的电阻率降低了四个数量级,并且Gphoto / Gdark的值是原来的两倍。另外,还研究了Sb掺杂量对掺杂SnS薄膜电学性能的影响,Sb的最佳掺杂量为重量的1.3%〜1.5%。

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