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Flexible substrate a-Si:H TFTs for space applications

机译:用于空间应用的柔性基板a-Si:H TFT

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We have fabricated hydrogenated amorphous silicon (a-Si:H) TFTs on Kapton/sup (R)/ polyimide flexible substrates and characterized their response to deployment-like mechanical stresses and to radiation exposure. To maintain substrate flatness and provide improved thermal transfer during fabrication, we used a pressure-sensitive silicone gel adhesive layer to mount Kapton/sup (R)/ substrates onto glass carriers. The test results, presented in this paper, are encouraging for space use of a-Si:H TFTs on polymeric substrates. Device function was retained even after 1 Mrad fast electron irradiation, and irradiation-induced device changes were removed by low-temperature thermal annealing. Although some TFTs were destroyed by substrate stressing, the majority survived with only small changes, suggesting that care in device design and placement may reduce or eliminate this problem.
机译:我们已经在Kapton / sup(R)/聚酰亚胺柔性基板上制造了氢化非晶硅(a-Si:H)TFT,并表征了它们对类似部署机械应力和辐射暴露的响应。为了保持基板的平整度并在制造过程中改善热传递,我们使用了压敏硅凝胶粘合剂层将Kapton / sup(R)/基板安装到玻璃载体上。本文提出的测试结果对于在聚合物基板上空间使用a-Si:H TFT令人鼓舞。即使在1 Mrad快速电子辐照后,器件功能仍然保留,并且通过低温热退火消除了辐照引起的器件变化。尽管某些TFT受到基板应力的破坏,但大多数TFT仍能幸存,只有很小的变化,这表明在器件设计和放置上的谨慎可能会减少或消除此问题。

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