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A STUDY ON PROPERTIES OF INFRARED DETECTOR FORA HGCDTE EPILAYERS USING PHOTOCURRENT MEASUREMENT

机译:光电流测量法对HGCDTE外延层红外探测器性能的研究

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Hg_(1-x)Cd_xTe (MCT) was grown by hot wall epitaxy. Prior to the MCT growth, the CdTe (111) buffer layer was grown on the GaAs substrate at the temperature of 590°C for 15 min. When the thickness of the CdTe buffer layer was 5 °μm or thicker, the full width at half maximum values obtained from the x-ray rocking curves were found to significantly decrease. After a good quality CdTe buffer layer was grown, the MCT epilayers were grown on the CdTe (111) /GaAs substrate at various temperatures in situ. The crystal quality for those epilayers was investigated by means of the x-ray rocking curves and the photocurrent experiment. The photoconductor characterization for the epilayers was also measured. The energy band gap of MCT was determined from the photocurrent measurement and the x composition rates from the temperature dependence of the energy band gap were turned out.
机译:HG_(1-X)CD_XTE(MCT)由热墙外延生长。在MCT生长之前,在590℃的温度下在GaAs底物上生长CdTe(111)缓冲层15分钟。当CdTe缓冲层的厚度为5°μm或较厚时,发现从X射线摇摆曲线获得的半最大值处的全宽度显着降低。在生长良好的质量Cdte缓冲层之后,在原位的各种温度下在CdTe(111)/ GaAs底物上生长MCT脱落剂。通过X射线摇摆曲线和光电流实验研究了那些脱节剂的晶体质量。还测量了脱椎的光电导体表征。从光电流测量确定MCT的能带隙,结果从能带间隙的温度依赖性的X成分速率确定。

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