Mask Roadmap, Mask Technology Trend, Critical Issues, and Activities of International SEMATECH

摘要

It is well known that the semiconductor industry continues to drive performance improvements through lithography resolution development. Further the International Technology Roadmap for Semiconductors (ITRS) timing continues to be driven aggressively resulting in less inherent lithography resolution advantage against the desired linewidth. The effect has been to require significantly tightened photomask specifications with aggressive timing constraints. Mask Error Enhancement Factors and wavelength choices are driving a need for multiple options for the photomask end user, which include Attenuated and Alternating Phase Shifting Masks. The compounded effect of the roadmap move-in results in extreme measures being needed to ensure the photomask infrastructure will be ready for these demands.