Method for enhancing image characteristics of mask for photo lithography in context of mask manufacturing, involves manufacturing mask and providing list with critical places on basis of mask layout

摘要

The method involves manufacturing a mask and providing a list with critical places on the basis of a mask layout, and producing an aerial image on the mask in the critical places in each case. A changed mask layout is transferred to a repairing device. The repairing device of the mask is modified according to the changed mask layout.