Resolution Enhancement Techniques and Mask Manufacturability for Sub-Wavelength Lithography

机译：亚波长光刻的分辨率增强技术和掩模可制造性

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This paper analyzes two resolution enhancement techniques: alternating (strong) PSM and sub-resolution assists (scattering bars) from the point of view of their applicability to manufacturing of integrated circuits (IC) of 130 nm and below.

机译：本文分析了两种分辨率增强技术：交替（强）PSM和亚分辨率辅助（散射条），从它们在130 nm及以下的集成电路（IC）的制造中的适用性的角度出发。

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《Conference on photomask and next-generation lithography mask technology》|2000年|p.40-46|共7页
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Lineard Karklin; Burn J.Lin;
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中图分类一般工业技术;
关键词
Photomasks; Resolution Enhancement Techniques; Optical Proximity Correction; Subresolution Assist; Off-axis Illumination; Phase Shifting Masks; Mask Error Factor; Process Windows;

机译：光罩;分辨率增强技术;光学接近度校正;次分辨率辅助;离轴照明;相移掩模;掩膜误差因子;处理视窗;
入库时间 2022-08-26 14:06:57

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1. Simple method to manufacture a self-aligning alternating phase-shifting photo mask for EUV photo lithography using existing photo mask manufacturing capabilities [J] . Research Disclosure . 2019,第658期

机译：使用现有光掩模制造能力制造用于EUV光刻的自对准交替相移光掩模的简单方法
2. Simple method to manufacture a self-aligning alternating phase-shifting photo mask for EUV photo lithography using existing photo mask manufacturing capabilities [J] . Research Disclosure . 2019,第658期

机译：使用现有的照片掩模制造能力制造用于EUV照片光刻的自对准交替相移照片掩模的简单方法
3. Lithographic resolution enhancement of a maskless lithography system based on a wobulation technique for flow lithography [J] . Kibeom Kim, Sangkwon Han, Jinsik Yoon, Applied Physics Letters . 2016,第23期

机译：基于摇摆技术的无掩模光刻系统的光刻分辨率提高
4. Resolution Enhancement Techniques and Mask Manufacturability for Sub-Wavelength Lithography [C] . Lineard Karklin, Burn J.Lin, SPIE-The International Society for Optical Engineering Conference on photomask and next-generation lithography mask technology . 2000

机译：分辨率增强技术和掩模制造性用于子波长光刻
5. Line search based inverse lithography technique for mask design [D] . Zhao, Xin 2012

机译：基于线路搜索的掩模设计的逆光刻技术
6. Effects of the Layer Height and Exposure Energy on the Lateral Resolution of Zirconia Parts Printed by Lithography-Based Additive Manufacturing [O] . Laura Conti, Daniel Bienenstein, Mario Borlaf, 2020

机译：层高和曝光能量对基于光刻的增材制造氧化锆零件横向分辨率的影响
7. Light-coupling masks for lensless, sub-wavelength optical lithography [O] . Heinz Schmid, Hans Biebuyck, Bruno Michel, 1998

机译：无透镜，子波长光学光刻的光耦合面罩
8. X-Ray Lithography at Approximately 100 A Linewidths Using X-Ray Masks Fabricated by Shadowing Techniques [R] . Flanders, D. C. 1979

机译：使用阴影技术制作的X射线掩模在大约100 a线宽下进行X射线光刻

Resolution Enhancement Techniques and Mask Manufacturability for Sub-Wavelength Lithography

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