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Photoreflection spectrum on Si-surface-delta-doped GaAs

机译:Si表面δ掺杂的GaAs上的光反射光谱

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Abstract: In this paper we present the observation of the interband transition in the GaAs (100) surface Si-delta-doping potential. Samples with different surface doping concentrations (N$-s$/ equals undoped, 3.0 $MUL 10$+12$/, 6.3 $MUL 10$+13$/, 2.4 $MUL 10$+14$/ and 3.6 $MUL 10$+4$/ cm$+$MIN@2$/) have been studied at room temperature in the MBE high vacuum chamber using modulated photo-reflection (PR) spectroscopy technique. The MBE chamber guarantees that all the sample surfaces are free of oxidation or uncontrollable contamination. The optical transition of at GaAs bandedge around 1.41 eV is strong and is almost independent of N$-s$/. A relatively weak feature above 1.42 eV has been observed which is clearly enhanced and blue-shifted following the increase of N$-s$/. The experimental results have been analyzed and well explained based on the self-consistent Schrodinger-Poisson equations. The theoretical analysis indicates that it is not proper to attribute the PR spectral peak of 1.42 eV simply to be certain subband-related optical transition. The observed spectral peak of 1.42 eV is more likely to be related to the high-index confined-levels in the half-V-shape conduction band at the sample surface. !18
机译:摘要:在本文中,我们介绍了GaAs(100)表面Si-delta掺杂电势中带间跃迁的观察。具有不同表面掺杂浓度的样品(N $ -s $ /等于未掺杂,3.0 $ MUL 10 $ + 12 $ /,6.3 $ MUL 10 $ + 13 $ /,2.4 $ MUL 10 $ + 14 $ /和3.6 $ MUL 10在室温下,使用调制光反射(PR)光谱技术在MBE高真空室中研究了$ + 4 $ / cm $ + MIN $ 2 $ /。 MBE腔室可确保所有样品表面均无氧化或无法控制的污染。 GaAs带宽在1.41 eV附近的光跃迁很强,几乎与N $ -s $ /无关。观察到1.42 eV以上的相对较弱的特征,随着N $ -s $ /的增加,明显增强并发生蓝移。实验结果已经基于自洽的Schrodinger-Poisson方程进行了分析并得到了很好的解释。理论分析表明,仅将1.42 eV的PR谱峰归因于某些与子带有关的光学跃迁是不合适的。观察到的1.42 eV的光谱峰更可能与样品表面的半V形导带中的高折射率限制能级有关。 !18

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