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A fluxless process of producing In-Au joints on copper substrates

机译:在铜基板上生产In-Au接头的无助熔剂工艺

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Based on the oxidation-free fluxless bonding technology, we have developed a bonding process to manufacture In-Au joints on copper substrates. 4 mm/spl times/4 mm Si blank dice and 6 mm/spl times/6 mm copper substrates are used. The dice are deposited with an indium- rich Cr-In-Au multilayer structure in one high vacuum to prevent oxidation. Right after deposition, the outer Au layer interacts with In layer to form AuIn/sub 2/ intermetallic compound. This compound is quite stable and thus can protect the In layer against oxygen penetration while exposing to ambient. On the other hand, it can be easily dissolved by the molten In during the bonding process. The substrate is deposited with Cr and Au. The dice are bonded to the substrates at 180/spl deg/C in an inert environment. Nearly void-free joints have been obtained as examined by a 75 MHz Scanning Acoustic Microscope (SAM). Cross sections of several samples are studied using SEM and EDX to identify the microstructure and composition of the joints. A shear test has been performed according to MIL-STD-883C. All the well-bonded devices meet the shear test force requirement. Despite the large mismatch on the thermal expansion coefficient between silicon and copper, no die cracking is observed on the 30 samples produced. To assess further endurance, two samples undergo thermal cycling test between -50 and 120/spl deg/C for 20 cycles. SAM examination indicates that the joints incur little degradation after the test. This bonding method requires neither flux nor scrubbing action. It is thus particularly attractive for bonding devices that cannot be exposed to flux.
机译:基于无氧化无助焊剂技术,我们开发了一种在铜基板上制造In-Au接头的粘接工艺。使用4 mm / spl次/ 4 mm Si裸片和6 mm / spl次/ 6 mm铜基板。在一个高真空中,将晶粒以富铟的Cr-In-Au多层结构沉积,以防止氧化。沉积之后,外层Au层立即与In层相互作用形成AuIn / sub 2 /金属间化合物。该化合物非常稳定,因此可以在暴露于环境的同时保护In层免受氧气渗透。另一方面,在键合过程中,它很容易被熔融的In溶解。用Cr和Au沉积衬底。在惰性环境下,将芯片以180 / spl deg / C的温度键合到基板上。如75 MHz扫描声显微镜(SAM)所检查,已获得几乎无空隙的接头。使用SEM和EDX研究了几个样品的横截面,以确定接头的微观结构和组成。根据MIL-STD-883C进行了剪切测试。所有粘合良好的装置均满足剪切试验力的要求。尽管硅和铜之间的热膨胀系数存在很大的不匹配,但在所生产的30个样品中未观察到管芯破裂。为了评估进一步的耐久性,两个样品在-50至120 / spl deg / C之间进行了20个循环的热循环测试。 SAM检查表明,测试后关节几乎没有降解。这种粘合方法既不需要助焊剂,也不需要擦洗作用。因此,对于不能暴露于助焊剂的粘合装置特别有吸引力。

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