首页> 外文会议>Electron Devices Meeting, 1999. IEDM Technical Digest. International >CoSi/sub 2/ integrated fuses on poly silicon for low voltage 0.18 /spl mu/m CMOS applications
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CoSi/sub 2/ integrated fuses on poly silicon for low voltage 0.18 /spl mu/m CMOS applications

机译:CoSi / sub 2 /多晶硅上的集成熔断器,适用于低压0.18 / splμ/ m CMOS应用

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摘要

The manufacturability and integration of the CoSi/sub 2//poly-Si fuse element for sub-0.18 /spl mu/m regime CMOS is demonstrated and evaluated. This paper addresses the mechanism and the driver circuit challenges for fuse programming (given the low operating voltage nature of the 0.18 /spl mu/m technology). This includes exploring different options to deliver the required programming energy, yet complying with low voltage limitation of the technology. Finally, it concludes by presenting the fuse programming characteristics and reliability studies of the high voltage (HV) driver of the circuit.
机译:演示并评估了CoSi / sub 2 // poly-Si熔丝元件在0.18 / spl mu / m制程下CMOS的可制造性和集成度。本文讨论了熔丝编程的机制和驱动器电路的挑战(考虑到0.18 / spl mu / m技术的低工作电压特性)。这包括探索各种选项以提供所需的编程能量,同时遵守该技术的低电压限制。最后,通过介绍电路的高压(HV)驱动器的熔丝编程特性和可靠性研究得出结论。

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