Pellicle-induced distortions on photomasks

摘要

Abstract: We have investigated the pellicle induced distortions on mask of different sizes. The pattern placement on the masks was measured prior to the pelliclization and after pelliclization. The performance of the automatic pelliclization process was compared to the distortions induced by manual pellicle mounting. All investigations were performed using the LEICA LMS IPRO at Leica's demo center in Wetzlar and at Siemens Mask Shop in Munich. The LMS IPRO was equipped with the new long working distance lens having a free working distance of 8mm. !3