Compact Laser Plasma EUV Source based on a Gas Puff Target for Metrology

摘要

In the paper a newly developed compact laser plasma EUV source is presented. The source is based on the double-stream gas puff target approach. The targets are formed by pulsed injection of high-Z gas (xenon) into a hollow stream of low-Z gas (helium) using the valve system composed of two electromagnetic valves and equipped with the double-nozzle setup. The outer stream of gas confines the inner stream improving the gas puff target characteristics (higher density of high-Z gas at longer distance from the nozzle output). It causes efficient absorption of laser energy in a plasma and strong EUV production. The source has been developed in the frame of the EUV sources development project under the MEDEA+ programme.