首页> 外文会议>Integrated Reliability Workshop Final Report, 1998. IEEE International >A constant gate current technique for obtaining low-frequency C-V characteristics of MOS capacitors
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A constant gate current technique for obtaining low-frequency C-V characteristics of MOS capacitors

机译:用于获得MOS电容器的低频C-V特性的恒定栅极电流技术

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摘要

A simple and accurate technique for low-frequency MOSFET gate capacitance measurement using the voltage response of these devices to constant gate current is described. The capability of this technique is demonstrated in Capacitance-Voltage (C-V) curves by showing the effects of gate current on the MOS characteristics. Using a Hewlett-Packard 4156 (HP4156) precision semiconductor parameter analyzer to measure the rate of voltage change across MOS capacitors while forcing a constant current, accurate C-V curve are derived over the 1pF to 1nF range.
机译:描述了一种使用这些器件对恒定栅极电流的电压响应进行低频MOSFET栅极电容测量的简单而精确的技术。通过显示栅极电流对MOS特性的影响,在电容电压(C-V)曲线中证明了该技术的能力。使用Hewlett-Packard 4156(HP4156)精密半导体参数分析仪来测量MOS电容器两端的电压变化率,同时强制施加恒定电流,可在1pF至1nF的范围内得出准确的C-V曲线。

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