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Fuzzy control of temperature in a semiconductor processing furnace

机译:半导体加工炉中温度的模糊控制

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摘要

The ability to control temperature in semiconductor processing furnaces is critical to the manufacturing of semiconductor devices. In this paper, a fuzzy PI controller is described that takes into account some of the unique characteristics of such a furnace. Entries in the rule base are used to prevent integrator windup and a fuzzy gain scheduler allows the controller to be tuned once and used over the whole operating temperature range of the system. Substantial improvements are shown for settling times following both large and small step changes in reference setpoint.
机译:在半导体加工炉中控制温度的能力对于半导体器件的制造至关重要。在本文中,描述了一种模糊PI控制器,该控制器考虑了这种熔炉的一些独特特性。规则库中的条目用于防止积分器饱和,并且模糊增益调度程序允许控制器一次调整并在系统的整个工作温度范围内使用。在参考设定值出现较大和较小的阶跃变化后,建立时间显着改善。

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