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Atomistic calculations of dopant binding energies in ZnGeP_2

机译:ZnGeP_2中掺杂剂结合能的原子计算

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Atomistic model has been applied to study various cation dopants, namely Cu, Ag, B, Al, Ga and In in ZnGeP_2. The pairwise interatomic potential terms representing the interaction of dopants with the host lattice ions are derived using first principle methods. Defect calculations based on Mott-Littleton methodology predict small binding energies for Cu and Ag substituting Zn in the latice which are in agreement with the available experimental data. The group III dopants (i.e. B, Al, Ga and In) at the Ge site are predicted to have large binding energies for a hole except B which shows a distinct behavior. This may be due to large mismatch in atomic sizes of B and Ge. At the Zn site, the calculated binding energies of the group III dopants place donor levels in the middle of the band gap.
机译:应用原子模型研究了ZnGeP_2中的各种阳离子掺杂剂,即Cu,Ag,B,Al,Ga和In。使用第一原理方法导出了表示掺杂剂与主体晶格离子相互作用的成对原子间势能项。基于Mott-Littleton方法的缺陷计算预测了晶格中Cu和Ag取代Zn的小结合能,这与可用的实验数据相符。据预测,Ge位点上的III族掺杂剂(即B,Al,Ga和In)对于空穴具有大的结合能,但B表现出不同的行为。这可能是由于B和Ge原子尺寸的巨大不匹配所致。在锌位点,计算得出的III族掺杂剂的结合能将供体能级置于带隙的中间。

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