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Characterization of HgCdTe epilayers grown on GaAs(211)B by molecular beam epitaxy

机译:通过分子束外延表征在GaAs(211)B上生长的HgCdTe外延层

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Abstract: The growth of HgCdTe(MCT) epilayers on GaAs(211)B substrate by molecular beam epitaxy (MBE) have been reported. The growth procedure of MCT is described. Various characterization techniques have been employed for evaluating the quality of MCT epilayers. A planar PV array are fabricated for assessment of MCT epilayer quality. The present results represent an important step toward the demonstration of MBE epilayers for fabrication of focal plane arrays.!2
机译:摘要:已经报道了分子束外延(MBE)在GaAs(211)B衬底上生长HgCdTe(MCT)外延层。描述了MCT的生长过程。已经采用了各种表征技术来评估MCT外延层的质量。制作了平面PV阵列以评估MCT外延层质量。目前的结果代表了朝着展示焦平面阵列制造MBE外延层迈出的重要一步。2

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