首页> 外文会议>Indium Phosphide and Related Materials, 1996. IPRM '96., Eighth International Conference on >As desorption from InGaAs monolayer during PH/sub 3/-purge in OMVPE growth of InP/InGaAs(1 ML)/InP heterostructures measured by X-ray CTR scattering
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As desorption from InGaAs monolayer during PH/sub 3/-purge in OMVPE growth of InP/InGaAs(1 ML)/InP heterostructures measured by X-ray CTR scattering

机译:通过X射线CTR散射测量InP / InGaAs(1 ML)/ InP异质结构在OMVPE生长中的PH / sub 3 /吹扫过程中从InGaAs单层解吸

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摘要

In this work, the effect of PH/sub 3/-purge after the growth of the heterolayer was investigated for InP/InGaAs(1 ML)/InP heterostructures. InP/InGaAs/InP samples were prepared by low pressure OMVPE on InP(001) substrates using TEGa, TMIn, AsII/sub 3/ and PH/sub 3/ as source gases. The growth temperature was set at 620/spl deg/C.
机译:在这项工作中,对于InP / InGaAs(1 ML)/ InP异质结构,研究了异质层生长后PH / sub 3 /吹扫的影响。使用TEGa,TMIn,AsII / sub 3 /和PH / sub 3 /作为原料气,在InP(001)基板上通过低压OMVPE制备InP / InGaAs / InP样品。生长温度设定为620 / spl℃/℃。

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