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Roughness effects in the infrared reflectance of thick 3C-SiC films grown on Si substrates

机译:硅衬底上生长的厚3C-SiC膜对红外反射率的粗糙度影响

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Abstract: We have analyzed the IR reflectivity spectra of micrometric SiC deposited on Si substrates by the CVD technique under different growth conditions. We show that the roughness at the SiC/Si interface gives rise to a damping of the interference fringes above the reststrahlen band without introducing any change of the mean value of the optical response which shows to be dispersionless. On the opposite, roughness at the SiC surface manifests through a falling of the reflectivity on the LO side of the reststrahlen band with respect to the TO one side, and a damping of the interference fringes together with a progressive decrease of the reflectance with increasing IR frequencies. These effects give account for most of the deviations from the optical response associated to the specular reflectance of flat surfaces in SiC/Si heterostructures with a low level of free carriers concentration. !13
机译:摘要:我们分析了在不同生长条件下,通过CVD技术沉积在硅衬底上的微米级碳化硅的红外反射光谱。我们表明,在SiC / Si界面处的粗糙度会导致对干涉条纹以上的干涉条纹的阻尼,而不会引起光学响应平均值的任何变化,而光学响应的​​平均值显示为无色散。相反,SiC表面的粗糙度表现为:reststrahlen带的LO侧相对于TO侧的反射率下降,并且干涉条纹的衰减以及反射率随IR的增加而逐渐降低。频率。这些效应说明了与自由载流子浓度低的SiC / Si异质结构中与平坦表面的镜面反射率相关的光学响应的​​大部分偏差。 !13

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