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Novel silicon fabrication process for high-aspect-ratio micromachined parts

机译:高纵横比微加工零件的新型硅制造工艺

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Abstract: Micromachining is often divided into two categories: bulk and surface micromachining. 'Bulk' micromachining generally refers to processes involving wet chemical etching of structures formed out of the silicon substrate and so is limited to fairly large, crude structures. 'Surface' micromachining allows intricate patterning of thin films of polysilicon and other materials to from essentially 2D layered parts (since the thickness of the parts is limited by the thickness of the deposited films). In addition to these two types of micromachining there is in fact a third type of micromachining as well, namely, 'mold' micromachining, in which the part is formed by filling a mold which was defined by photolithographic means. Historically micromachining molds have been formed in some sort of photopolymer, be it with x-ray lithography (LIGA) or more conventional UV lithography, with the aim of producing piece parts. Recently, however, several groups including ours at Sandia have independently come up with the idea of forming the mold for mechanical parts by etching into the silicon substrate itself. In Sandia's mold process, the mold is recessed into the substrate using a deep silicon trench etch, lines with a sacrificial or etch-stop layer, and then filled with any of a number of mechanical materials. The completed structures are not ejected from the mold to be used as piece parts, rather the mold is dissolved from around selected movable segments of the parts, leaving the parts anchored to the substrate. Since the mold is recessed into the substrate, the whole micromechanical structure can be formed, planarized, and integrated with standard silicon microelectronic circuits before the release etch. In addition, unlike surface-micromachined parts, the thickness of the molded parts is limited by the depth of the trench etch (typically 10- 50 $mu@m) rather than the thickness of deposited polysilicon (typically 2 $mu@m). The capability of fabricating thicker (and therefore much stiffer and more massive) parts is critical for motion-sensing structures involving large gimballed platforms, proof masses, etc. At the same time, the planarized mold technology enables the subsequent fabrication of features (for example flexible springs and flexures), much finer than those possible with bulk processes. !9
机译:摘要:微细加工通常分为两类:整体微细加工和表面微细加工。 “批量”微机械加工通常是指涉及对从硅衬底形成的结构进行湿化学蚀刻的工艺,因此仅限于相当大的粗结构。 “表面”微加工允许对多晶硅和其他材料的薄膜进行复杂的图案化,形成基本上为2D的分层零件(因为零件的厚度受到沉积膜厚度的限制)。除了这两种类型的微机械加工,实际上还有第三种微机械加工,即“模具”微机械加工,其中零件是通过填充由光刻方法限定的模具而形成的。从历史上讲,微加工模具是用某种光敏聚合物制成的,无论是用X射线光刻(LIGA)还是更常规的UV光刻技术,目的都是生产零件。但是,最近,包括我们在Sandia的团队在内的几个小组独立提出了通过蚀刻到硅基板本身来形成用于机械零件的模具的想法。在桑迪亚(Sandia)的模具工艺中,使用深硅沟槽蚀刻将模具凹入基板中,并在其上形成牺牲层或蚀刻停止层,然后填充多种机械材料中的任何一种。完整的结构不会从模具中弹出以用作零件,而是从零件的选定可移动段周围溶解模具,从而将零件锚定到基板上。由于模具凹进了基板中,因此可以在释放蚀刻之前,将整个微机械结构形成,平面化并与标准硅微电子电路集成在一起。另外,与表面微机械加工的零件不同,模制零件的厚度受沟槽刻蚀的深度(通常为10-50μm)的限制,而不是由沉积的多晶硅的厚度(通常为2μm)限制。制造较厚(因此更硬,更重)零件的能力对于涉及大型万向节平台,检测质量等的运动感应结构至关重要。同时,平面化的模具技术还可以进行特征的后续制造(例如,挠性弹簧和挠性),比散装工艺可能产生的挠性要好得多。 !9

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