首页> 外文会议>Indium Phosphide and Related Materials, 1994. Conference Proceedings., Sixth International Conference on >A comparison of iron concentration and photorefractive gain in iron doped indium phosphide
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A comparison of iron concentration and photorefractive gain in iron doped indium phosphide

机译:掺铁磷化铟中铁浓度和光折变增益的比较

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The infrared photorefractive (PR) effect in InP can be enhanced using applied electric fields to increase gain for potential applications such as amplifying coherent optical signals. Knowledge of the defect physics of InP material is a prerequisite to understanding the PR behavior and consequently the optimization of the PR response. Previous attempts to explain the PR effect have been marked by the use of InP:Fe samples which were not fully characterized by techniques other than by PR measurement alone. Some results have been reported which lead to the conclusion that both shallow traps and electron-hole competition are dominant in semi-insulating photorefractive materials, while other workers using different crystals, have concluded that the shallow levels are relatively unimportant for InP:Fe and that the photorefractive effect is dominated by holes at room temperature. The divergent conclusions may be due in part to defect concentrations which vary from sample to sample. In this experimental investigation a series of crystals were grown using different concentrations of iron dopant and shallow donor impurities, which were then compared in PR experiments at room temperature to measure the two-wave mixing gain. The two main defects were then measured by independent means to determine a relationship between PR gain and defect concentration. Iron exists in one of two electronic states, either ionized (Fe/sup 2+/) or neutral (Fe/sup 3+/). The concentration of Fe/sup 2+/ is equal to the net shallow donor concentration. The neutral state Fe/sup 3+/ can be determined by electron paramagnetic resonance (EPR) or from an analysis of the near infrared absorption spectra in the range 0.6 to 1.3 eV. The absorption of iron doped InP in this photon range is caused by two photoionization processes, the optical excitation of electrons from Fe/sup 2+/ into the conduction band and the excitation of holes from Fe/sup 2+/ into the valence band. Both processes also give rise to the YAG laser absorption at 1.06 /spl mu/m (1.17 eV) and provide the basis for the photorefractive effect. From an analysis of these data, we conclude that the diffraction efficiency is primarily dependent on the Fe/sup 3+/ concentration, and that the PR gain can be optimized by selecting crystals within a range of Fe/sup 3+Fe/sup 2+/ ratios.
机译:InP中的红外光折射(PR)效果可以使用施加的电场来增强,以增加诸如放大相干光信号等潜在应用的增益。了解InP材料的缺陷物理知识是了解PR行为并因此优化PR响应的先决条件。以前的解释PR效应的尝试已通过使用InP:Fe样品进行了标记,这些样品仅通过PR测量无法通过其他技术充分表征。已经报道了一些结果,得出的结论是,浅陷阱和电子-空穴竞争在半绝缘光折变材料中均占主导地位,而其他使用不同晶体的工作者得出的结论是,浅水平对于InP:Fe相对不重要,并且在室温下,光折射作用主要由孔引起。得出不同结论的部分原因可能是样品中的缺陷浓度不同。在此实验研究中,使用不同浓度的铁掺杂剂和浅施主杂质生长了一系列晶体,然后将其在室温下的PR实验中进行比较,以测量两波混合增益。然后通过独立的方法测量两个主要缺陷,以确定PR增益与缺陷浓度之间的关系。铁以两种电子状态之一存在,即离子化(Fe / sup 2 + /)或中性(Fe / sup 3 + /)。 Fe / sup 2 + /的浓度等于净浅施主浓度。中性状态Fe / sup 3 + /可以通过电子顺磁共振(EPR)或通过分析0.6至1.3 eV范围内的近红外吸收光谱来确定。在此光子范围内的铁掺杂InP的吸收是由两个光电离过程引起的,分别是从Fe / sup 2 + /进入导带的电子的光激发和从Fe / sup 2 + /进入价带的空穴的激发。这两个过程还导致YAG激光以1.06 / spl mu / m(1.17 eV)的吸收率,并为光折射效应提供基础。通过对这些数据的分析,我们得出结论,衍射效率主要取决于Fe / sup 3 + /浓度,并且可以通过选择Fe / sup 3 + Fe / sup 2范围内的晶体来优化PR增益。 + /比率。

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