A single wafer reactor AIX 200/4 with improved performance for InP based materials has been developed. The AIX 200/4 reactor is a horizontal OMVPE reactor. The new designed reactor follows the widely used AIX 200 reactor. Additionally, it offers an enlarged diameter and some new features to influence the layer uniformity. The considerations derived from the planetary multiwafer reactors leading to the new reactor design are presented and the experimental results are discussed. Also it could be demonstrated, that all processes from the AIX 200 reactors can be easily transferred to this new AIX 200/4 reactor.
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